SiFusion - Process Applications
SiFusion polysilicon furnaceware offers key advantages for different wafer manufacturing processes.
High Temperature Processes
SiFusion furnaceware performs without deformities in demanding processes reaching temperatures up to 1350°C.
LPCVD Processes
SiFusion's products generate essentially no particles and reduce costly routine cleaning and associated hazardous wastes.
Additional Processes
SiFusion is also ideal for other thermal operations, including the amorphous silicon process.